Atomic Layer Deposition System

Atomic Layer Deposition System

atomic layer deposition system
Material:Stainless steel
Vacuum: ≤10-3 Torr
Wafer size up to 300mm
Excellent program control and intrinsic cycle time < 1 sec Excellent film quality and uniformity Wafer stage temperature 400 ℃ Five precursor modules and two process gases Applications:
High-k gate oxides
Coating of nano-porous structures
Storage capacitor dielectrics
Diffusion barriers, seed for copper metalization and Passivation layers
Blocking layers for moisture and gas-impermeable structures

online-enquiry-buttonFor Specialist Advice Call:
+91 971-774-9249

Online Enquiry Form

Your Contact Details

 I authorise Greentelligent Technologies LLP to contact me by telephone.


Your Message