Chemical Vapour Deposition System

LPCVD

chemical vapour deposition system
Temperature Range:
Maximum Temperature:1500 ℃
Control Accuracy: ±1 ℃
Temperature Uniformity:< ±5 % Equipment Characteristics:
Material:Quartz
Size(inner):2” ~ 8”
Vacuum: ≤10-3 Torr

Features:
PID microprocessor controlled LED display
Three zone control
Process gas flow control
Furnace type
Furnace type: Horizontal、Vertical (Option)


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