Inline Sputter System

In-line Sputter System

inline sputter system
Chamber Construction:
All internal surfaces are electro polished 304 stainless steel

Features:
Vertical substrate feed
Substrate size : 490×390 mm2 (glass)
Process chamber: 900×300×1100 mm (W×D×H)
10-7 Torr Ultimate vacuum by Turbo molecular pump
Movement: speed programmabl
PC-base control real time record chamber data
Uniformity: <±5% Two heating station Up to three cathode (process chamber) Option
Chamber heating option
Choice of Turbo/Cryo/Diffusion Pump available
Ion source for pre-cleaning

Applications
FPD
Electronic components
Solar cells


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