Physical Vapor Deposition System

Resistance Evaporator System

resistance evaporator system
Chamber Construction:
All internal surfaces are electro polished 304 stainless steel
Features:
Multiple sources with sequential operation
Quartz crystal monitor for closed loop thickness control
Automated process operation
Almost of evaporation materials
3 kW power supply with digital ammeter for sequential thin film deposition
Substrate size up to 12”
10-7 Torr Ultimate vacuum

Option:
Substrate heating available 300°C, 500°C, or 800°C
Substrate rotation
Choice of Turbo/Cryo/Diffusion Pump available
Load lock

Applications:
This is system is currently set up for general metal


online-enquiry-buttonFor Specialist Advice Call:
+91 971-774-9249


Resistance Evaporator for Organic Material

resistance evaporator for organic material
Chamber Construction:
All internal surfaces are electro polished 304 stainless steel
Features:
Multiple sources with sequential operation
Accurate temperature measurements and controls are accomplished with a thermocouple well into the heart of the heat zone
Directly heated high purity graphite
Quartz crystal monitor for closed loop thickness control
Planetary substrate rotation system
Automated process operation
10-7 Torr Ultimate vacuum

Option:
K-cell set option
Substrate can be stored Mask holder and mask shutter
Substrate rotation
Choice of Turbo/Cryo/Diffusion Pump available
Combined with glove-box

Applications:
Deposition of organic material
Integrated with glove box for OLED application


online-enquiry-buttonFor Specialist Advice Call:
+91 971-774-9249


Electron Beam Evaporation

electron beam evaporation
Chamber Construction:
Chamber is water cooled stainless steel
Features:
Four target pockets
Quartz crystal monitor for closed loop thickness control
Planetary substrate rotation system
6 kW Power Supply, 10kW/15kW option
Uses Cryo-pump for rapid pump down
X-Y sweep supply
Automated process operation
10-7Torr Ultimate vacuum

Option:
Substrate rotation
Substrate heating available 300°C, 500°C
Choice of Cryo/Diffusion Pump available
Ion Source

Applications:
Thin Film Depositions


online-enquiry-buttonFor Specialist Advice Call:
+91 971-774-9249


Multi Cathode DC/RF Magnetron Sputter Deposition Systems

multi cathode dc/rf magnetron sputter deposition systems
Chamber Construction:
All internal surfaces are electro polished 304 stainless steel
Features:
Multi-cathode DC/RF magnetron sputtering
+/- 5% or better uniformity
RF, DC or pulsed DC cathode power supplies
Planetary substrate rotation system
Automated process operation
Substrate size up to 12”
10 -6 torr in 30 minutes
10-7 Torr Ultimate vacuum by Turbo molecular pump

Option:
Substrate heating available 300°C, 500°C, or 800°C
RF or DC substrate bias
Substrate rotation
Pressure control by a throttle valve
Sputter up, down or sideways configuration
Choice of Turbo/Cryo/Diffusion Pump available
Ion Source for IBAD and substrate pre-cleaning
Load lock

Applications:
Materials research
Thin film research
Pilot production


online-enquiry-buttonFor Specialist Advice Call:
+91 971-774-9249


UHV Series – Sputter Deposition System

UHV Series sputter deposition systems
Chamber Construction:
All internal surfaces are electro polished 304 stainless steel
Features:
Up to five sputter-guns
Substrate heating with RF and DC bias
Substrate size up to 4”
UHV version with load lock chamber
Ultra-high-vacuum sputter system for R&D and pilot production (base pressure ≦10-9 )

Option:
Substrate heating available 300°C, 500°C, or 800°C
Pressure control by a throttle valve
Sputter up, down or sideways configuration
Choice of Turbo/Cryo/Diffusion Pump available
Ion Source for IBAD and substrate pre-cleaning

Applications:
Materials research
Thin film research
Pilot production


online-enquiry-buttonFor Specialist Advice Call:
+91 971-774-9249




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