Plasma Etch

Plasma Etch

plasma etch
Chamber Construction:
All internal surfaces are electro polished 304 stainless steel

Features:
Parallel plate reactor type
Z axis electrical movement 50 mm
Substrate 100℃ electrical heating
Maximum 6” wafer or small sample
PID pressure control
Automated process operation
600 watt 13.56Mhz generator
5×10-6 Torr Ultimate vacuum

Option
Load lock option only
Gas scrubber for process gases evolved
Chamber Wall heating

Applications
Stripping or ashing
Dry etching


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